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About Us
Our products are environment-friendly and allow natural drainage
These have chemicals used to remove metal impurities, organic materials and
��particles that adhere on the surface in the process of semiconductor water and
��LCD glass cleaning
These have chemicals that remove SiO2 slurry left on the surface after Chemical
��Mechanical Polishing (CMP) processes
Removes left on the surface, after using SPM (H2SO4, H2O2 mixed liquid)
��glass surface treatment
Cleaning after ...
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WATRIX-10G , the electrolyzed water generator produce HPEW(High-Purity ...
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WATRIX-10G, the electrolyzed water generator produce HPEW(High-Purity ...
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